13th International CMP Conference - Members
Members 1 - 25 of 39
User IdPrimary SpecialtySecondary SpecialtyCountryPoints
aphilipossian
PlanarizationCleaning and Surface PreparationUnited States3626
wgeaster
Process MaterialsProcess MaterialsUnited States22
warg0928
PlanarizationContamination ControlUnited States27
cliffspiro
PlanarizationOtherUnited States52
deslutz
Process MaterialsPlanarizationUnited States38
Hadder
PlanarizationPlanarizationUnited States23
Hoopasan
PlanarizationProcess MaterialsUnited States30
GeneDavis
PlanarizationPlanarizationUnited States28
hdjeong
PlanarizationCleaning and Surface PreparationKorea - (South) Republic of58
hiroyukimiyauchi
PlanarizationPlanarizationUnited States28
jrcole
PlanarizationPlanarizationUnited States23
jkasthuri
PlanarizationPlanarizationUnited States23
jaykphd
PlanarizationPlanarizationUnited States27
semdoli
PlanarizationCleaning and Surface PreparationKorea - (South) Republic of41
steigerwald
PlanarizationPlanarizationUnited States23
keiichi_kimura
PlanarizationPlanarizationUnited States23
Leila
University ResearchUniversity ResearchUnited States24
Len.Borucki
PlanarizationProcess and Equipment SimulationUnited States34
mmoinpour
PlanarizationDepositionUnited States171
MarioBrands
PlanarizationPlanarizationUnited States24
kroellm
Process MaterialsPlanarizationGermany26
mpevny
PlanarizationPlanarizationUnited States28
ptconnor
Contamination ControlProcess MaterialsUnited States24
cmpfilterguy
PlanarizationCleaning and Surface PreparationUnited States54
rakesh
PlanarizationCleaning and Surface PreparationUnited States38